The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 12, 2022

Filed:

Jul. 17, 2020
Applicant:

Texas Instruments Incorporated, Dallas, TX (US);

Inventors:

Chin-yu Tsai, Allen, TX (US);

Guruvayurappan Mathur, Plano, TX (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/10 (2006.01); H01L 27/092 (2006.01); H01L 29/45 (2006.01); H01L 29/78 (2006.01); H01L 21/265 (2006.01); H01L 21/8238 (2006.01); H01L 21/225 (2006.01); H01L 21/324 (2006.01); H01L 21/285 (2006.01); H01L 21/74 (2006.01); H01L 29/66 (2006.01); H01L 21/266 (2006.01);
U.S. Cl.
CPC ...
H01L 29/1083 (2013.01); H01L 21/2253 (2013.01); H01L 21/266 (2013.01); H01L 21/26513 (2013.01); H01L 21/28518 (2013.01); H01L 21/324 (2013.01); H01L 21/74 (2013.01); H01L 21/823814 (2013.01); H01L 21/823892 (2013.01); H01L 27/0922 (2013.01); H01L 29/1095 (2013.01); H01L 29/45 (2013.01); H01L 29/66681 (2013.01); H01L 29/7816 (2013.01);
Abstract

An integrated circuit includes an extended drain MOS transistor. The substrate of the integrated circuit has a lower layer with a first conductivity type. A drain well of the extended drain MOS transistor has the first conductivity type. The drain well is separated from the lower layer by a drain isolation well having a second, opposite, conductivity type. A source region of the extended drain MOS transistor is separated from the lower layer by a body well having the second conductivity type. Both the drain isolation well and the body well contact the lower layer. An average dopant density of the second conductivity type in the drain isolation well is less than an average dopant density of the second conductivity type in the body well.


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