The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 05, 2022

Filed:

Mar. 11, 2020
Applicant:

Kokusai Electric Corporation, Tokyo, JP;

Inventors:

Takashi Nakagawa, Toyama, JP;

Yoshiro Hirose, Toyama, JP;

Naofumi Ohashi, Toyama, JP;

Tadashi Takasaki, Toyama, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/40 (2006.01); H01L 21/02 (2006.01); H01L 21/687 (2006.01); H01L 21/67 (2006.01); H01L 21/205 (2006.01); C23C 16/34 (2006.01); C23C 16/44 (2006.01); H01L 21/677 (2006.01); C23C 16/458 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02271 (2013.01); C23C 16/345 (2013.01); C23C 16/4412 (2013.01); H01L 21/0217 (2013.01); H01L 21/205 (2013.01); H01L 21/67017 (2013.01); H01L 21/68764 (2013.01); H01L 21/68771 (2013.01); C23C 16/4584 (2013.01); H01L 21/67754 (2013.01);
Abstract

There is provided a technique that includes: substrate mounting plate where substrates are arranged circumferentially; rotator rotating the substrate mounting plate; gas supply structure disposed above the substrate mounting plate from center to outer periphery thereof; gas supplier including the gas supply structure and controlling supply amount of gas supplied from the gas supply structure; gas exhaust structure installed above the substrate mounting plate at downstream side of the gas supply structure in rotation direction; gas exhauster including the gas exhaust structure and controlling exhaust amount of gas exhausted from the gas exhaust structure; and gas main component amount controller including the gas supplier and the gas exhauster and controlling gas main component amount in the gas supplied from the gas supply structure to the substrates and the gas main component amount in the gas supplied to the substrates from the center to the outer periphery of the mounting plate.


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