The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 05, 2022
Filed:
May. 20, 2019
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Koji Yamagishi, Miyagi, JP;
Shota Sasaki, Miyagi, JP;
Shinji Maekawa, Miyagi, JP;
Daisuke Yoshikoshi, Miyagi, JP;
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); B01D 53/76 (2006.01); B01D 53/38 (2006.01); C23C 16/455 (2006.01); C23C 16/50 (2006.01); G01L 9/00 (2006.01); F16L 23/00 (2006.01); C23C 16/40 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3244 (2013.01); B01D 53/38 (2013.01); B01D 53/76 (2013.01); C23C 16/401 (2013.01); C23C 16/45544 (2013.01); C23C 16/45561 (2013.01); C23C 16/50 (2013.01); F16L 23/006 (2013.01); G01L 9/0072 (2013.01); H01J 2237/006 (2013.01); H01J 2237/334 (2013.01);
Abstract
An article for use in a plasma processing apparatus includes a gas supply pipe, and a component disposed in the gas supply pipe. The component is configured to cause radicals of gas passing through the gas supply pipe to be deactivated in the component.
Yamagishi, Koji. (2022). Radical deactivation component, plasma processing apparatus using the same and radical deactivation method (U.S. Patent No. 11380522). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11380522
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile