The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 05, 2022

Filed:

Jun. 03, 2020
Applicant:

Applied Materials Israel Ltd., Rehovot, IL;

Inventors:

Irad Peleg, Tel Aviv, IL;

Ran Schleyen, Rehovot, IL;

Boaz Cohen, Lehavim, IL;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 7/00 (2017.01); G01N 21/95 (2006.01); G06T 7/11 (2017.01); G06N 3/06 (2006.01); G06K 9/62 (2022.01); G06V 10/75 (2022.01);
U.S. Cl.
CPC ...
G06T 7/0008 (2013.01); G01N 21/9501 (2013.01); G06K 9/6215 (2013.01); G06K 9/6256 (2013.01); G06N 3/06 (2013.01); G06T 7/11 (2017.01); G06V 10/751 (2022.01); G06T 2207/10061 (2013.01); G06T 2207/20084 (2013.01); G06T 2207/30148 (2013.01);
Abstract

A system of classifying a pattern of interest (POI) on a semiconductor specimen, where the system includes a processor and memory circuitry configured to obtain a high-resolution image of the POI, and generate data usable for classifying the POI in accordance with a defectiveness-related classification. Generating the data utilizes a machine learning model that has been trained in accordance with training samples. The training samples include a high-resolution training image captured by scanning a respective training pattern on a specimen, the respective training pattern being similar to the POI, and a label associated with the image. The label is derivative of low-resolution inspection of the respective training pattern.


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