The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 05, 2022
Filed:
Jul. 27, 2020
Applicant:
Kla Corporation, Milpitas, CA (US);
Inventors:
Martin Plihal, Pleasanton, CA (US);
Prasanti Uppaluri, Saratoga, CA (US);
Saravanan Paramasivam, Chennai, IN;
Assignee:
KLA CORPORATION, Milpitas, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 7/00 (2017.01); G06T 7/246 (2017.01);
U.S. Cl.
CPC ...
G06T 7/0004 (2013.01); G06T 7/246 (2017.01); G06T 2207/10061 (2013.01); G06T 2207/20081 (2013.01); G06T 2207/30148 (2013.01);
Abstract
Machine learning approaches provide additional information about semiconductor wafer inspection stability issues that makes it possible to distinguish consequential process variations like process excursions from minor process variations that are within specification. The effect of variable defect of interest (DOI) capture rates in the inspection result and the effect of variable defect count on the wafer can be monitored independently.