The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 28, 2022
Filed:
Feb. 14, 2020
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Henricus Martinus Johannes Van De Groes, Tiel, NL;
Johannes Hubertus Antonius Van De Rijdt, Gemert, NL;
Marcel Pieter Jacobus Peeters, Weert, NL;
Chien-Hung Tseng, Zhubei, TW;
Henricus Petrus Maria Pellemans, Veldhoven, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
G03F 9/7046 (2013.01); G03F 9/7011 (2013.01);
Abstract
A method of aligning a substrate within an apparatus. The method includes determining a substrate grid based on measurements of a plurality of targets, each at different locations on a substrate. The determining includes repetitions of updating the substrate grid after each measurement of a target, and using the updated grid to align a measurement of a subsequent target.