The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 21, 2022
Filed:
Aug. 23, 2019
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Moriyoshi Kinoshita, Iwate, JP;
Yuji Sasaki, Iwate, JP;
Junichi Sato, Iwate, JP;
Takashi Asakawa, Iwate, JP;
Assignee:
TOKYO ELECTRON LIMITED, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/673 (2006.01); H01L 21/67 (2006.01); F27D 3/00 (2006.01); H01L 21/677 (2006.01); F27D 7/06 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67389 (2013.01); F27D 3/0084 (2013.01); H01L 21/673 (2013.01); H01L 21/67109 (2013.01); H01L 21/67259 (2013.01); H01L 21/67294 (2013.01); H01L 21/67769 (2013.01); H01L 21/67775 (2013.01); F27D 2003/0085 (2013.01); F27D 2007/063 (2013.01);
Abstract
A substrate processing apparatus includes: a carrier storage rack configured to place and store a carrier that accommodates a substrate; a gas supply configured to supply an inert gas into the carrier placed on the carrier storage rack; and a controller configured to control whether to supply the inert gas into the carrier based on at least one of carrier information and substrate information.