The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 21, 2022

Filed:

Dec. 05, 2018
Applicant:

The Institute of Optics and Electronics, the Chinese Academy of Sciences, Sichuan, CN;

Inventors:

Fuchao Xu, Chengdu, CN;

Xin Jia, Chengdu, CN;

Dachun Gan, Chengdu, CN;

Tingwen Xing, Chengdu, CN;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 11/02 (2006.01); G01B 11/24 (2006.01); G01B 9/02 (2022.01);
U.S. Cl.
CPC ...
G01B 11/2441 (2013.01); G01B 9/02049 (2013.01);
Abstract

Disclosed is a stitching-measurement device adapted for performing stitching-measurement on a surface of a concave spherical lens, including: an interferometer, a reference lens, a first plane mirror, a second plane mirror, a first adjustment mechanism, a second adjustment mechanism, a concave spherical object to be measured, a motion table and a control mechanism, the first plane mirror being mounted on the first adjustment mechanism configured to change a position of the first plane mirror; the second plane mirror being mounted on the second adjustment mechanism configured to change a position of the second plane mirror; the concave spherical object to be measured being placed on the motion table configured to change a position of the concave spherical object to be measured; the control mechanism communicating with the interferometer, the first adjustment mechanism, the second adjustment mechanism, and the motion table for issuing control signals, wherein by the first adjustment mechanism and the second adjustment mechanism, an included angle between the first plane mirror and the second plane mirror is adjusted in such a way that light beam incident on the concave spherical object to be measured is inclined by a first angle relative to light beam emitted from the reference lens, thereby avoiding an operation of inclining the concave spherical object to be measured during the stitching-measurement.


Find Patent Forward Citations

Xu, Fuchao. (2022). Stitching-measurement device and stitching-measurement method (U.S. Patent No. 11365964). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11365964

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