The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 14, 2022

Filed:

Nov. 24, 2020
Applicant:

Fractilia, Llc, Austin, TX (US);

Inventor:

Chris Mack, Austin, TX (US);

Assignee:

Fractilia, LLC, Austin, TX (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/22 (2006.01); G06T 7/13 (2017.01); G06T 7/40 (2017.01); G06T 7/42 (2017.01); G06T 7/49 (2017.01); G06T 5/00 (2006.01); G01Q 30/02 (2010.01); G01Q 30/06 (2010.01); H01J 37/28 (2006.01);
U.S. Cl.
CPC ...
H01J 37/222 (2013.01); G01Q 30/02 (2013.01); G01Q 30/06 (2013.01); G06T 5/002 (2013.01); G06T 7/13 (2017.01); G06T 7/40 (2013.01); G06T 7/42 (2017.01); G06T 7/49 (2017.01); H01J 37/28 (2013.01); G06T 2207/10061 (2013.01); G06T 2207/30148 (2013.01); H01J 2237/2814 (2013.01); H01J 2237/2817 (2013.01);
Abstract

A method is disclosed. The method includes receiving measured linescan information describing a pattern structure of a feature, applying the received measured linescan information to an inverse linescan model that relates measured linescan information to feature geometry information, identifying, based at least in part on the applying the received measured linescan model to the inverse linescan model, feature geometry information that describes a feature that would produce a linescan corresponding to the received measured linescan information, determining, at least in part using the inverse linescan model, feature edge positions of the identified feature, and analyzing the feature edge positions to detect the presence or absence of defects in the pattern structure.


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