The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jun. 07, 2022

Filed:

Oct. 06, 2015
Applicant:

Tel Manufacturing and Engineering of America, Inc., Chaska, MN (US);

Inventors:

Jeffery W. Butterbaugh, Eden Prairie, MN (US);

Chimaobi W. Mbanaso, Chaska, MN (US);

David Scott Becker, Excelsior, MN (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/683 (2006.01); H01L 21/02 (2006.01); H01L 21/67 (2006.01); B08B 5/04 (2006.01);
U.S. Cl.
CPC ...
H01L 21/683 (2013.01); B08B 5/04 (2013.01); H01L 21/02041 (2013.01); H01L 21/02043 (2013.01); H01L 21/67051 (2013.01);
Abstract

Disclosed herein are systems and methods for treating the surface of a microelectronic substrate, and in particular, relate to an apparatus and method for scanning the microelectronic substrate through a cryogenic fluid mixture used to treat an exposed surface of the microelectronic substrate. The fluid mixture may be expanded through a nozzle to form an aerosol spray or gas cluster jet (GCJ) spray and may impinge the microelectronic substrate and remove particles from the microelectronic substrate's surface. In one embodiment, a two-stage gas nozzle may be used to expand a fluid mixture with a liquid phase concentration of greater than 10% by weight.


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