The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 31, 2022

Filed:

Nov. 25, 2019
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Bing Dang, Chappaqua, NY (US);

Jeffrey D. Gelorme, Burlington, CT (US);

John U. Knickerbocker, Monroe, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/48 (2006.01); H01L 21/56 (2006.01); H01L 23/538 (2006.01); H01L 21/48 (2006.01); H01L 25/065 (2006.01); H01L 21/78 (2006.01); H01L 23/31 (2006.01); H01L 23/29 (2006.01); H01L 23/00 (2006.01);
U.S. Cl.
CPC ...
H01L 21/7813 (2013.01); H01L 21/486 (2013.01); H01L 21/568 (2013.01); H01L 23/293 (2013.01); H01L 23/3107 (2013.01); H01L 23/481 (2013.01); H01L 23/5384 (2013.01); H01L 24/03 (2013.01); H01L 24/05 (2013.01); H01L 24/13 (2013.01); H01L 24/19 (2013.01); H01L 24/94 (2013.01); H01L 24/97 (2013.01); H01L 21/561 (2013.01); H01L 23/3128 (2013.01); H01L 25/0655 (2013.01); H01L 2224/0239 (2013.01); H01L 2224/02331 (2013.01); H01L 2224/02335 (2013.01); H01L 2224/02379 (2013.01); H01L 2224/03002 (2013.01); H01L 2224/03416 (2013.01); H01L 2224/03452 (2013.01); H01L 2224/03515 (2013.01); H01L 2224/03831 (2013.01); H01L 2224/04105 (2013.01); H01L 2224/05008 (2013.01); H01L 2224/05147 (2013.01); H01L 2224/12105 (2013.01); H01L 2224/1301 (2013.01); H01L 2224/13024 (2013.01); H01L 2224/13025 (2013.01); H01L 2224/13109 (2013.01); H01L 2224/13111 (2013.01); H01L 2224/13113 (2013.01); H01L 2224/13116 (2013.01); H01L 2224/13118 (2013.01); H01L 2224/13139 (2013.01); H01L 2224/13144 (2013.01); H01L 2224/13147 (2013.01); H01L 2224/16235 (2013.01); H01L 2224/24137 (2013.01); H01L 2224/25171 (2013.01); H01L 2224/73267 (2013.01); H01L 2224/81005 (2013.01); H01L 2224/82005 (2013.01); H01L 2224/94 (2013.01); H01L 2224/95001 (2013.01); H01L 2924/15192 (2013.01); H01L 2924/15311 (2013.01);
Abstract

A support structure for use in fan-out wafer level packaging is provided that includes, a silicon handler wafer having a first surface and a second surface opposite the first surface, a release layer is located above the first surface of the silicon handler wafer, and a layer selected from the group consisting of an adhesive layer and a redistribution layer is located on a surface of the release layer. After building-up a fan-out wafer level package on the support structure, infrared radiation is employed to remove (via laser ablation) the release layer, and thus remove the silicon handler wafer from the fan-out wafer level package.


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