The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 31, 2022
Filed:
Sep. 08, 2020
Applied Materials, Inc., Santa Clara, CA (US);
Lara Hawrylchak, Gilroy, CA (US);
Matthew D. Scotney-Castle, Morgan Hill, CA (US);
Norman L. Tam, Cupertino, CA (US);
Matthew Spuller, Belmont, CA (US);
Kong Lung Samuel Chan, Newark, CA (US);
Dongming Iu, Union City, CA (US);
Stephen Moffatt, St. Brelade, JE;
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Implementations described herein provide for thermal substrate processing apparatus including two thermal process chambers, each defining a process volume, and a substrate support disposed within each process volume. One or more remote plasma sources may be in fluid communication with the process volumes and the remote plasma sources may be configured to deliver a plasma to the process volumes. Various arrangements of remote plasma sources and chambers are described.