The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 17, 2022
Filed:
Apr. 23, 2020
Shanghai Huali Integrated Circuit Corporation, Shanghai, CN;
Runling Li, Shanghai, CN;
Yanwei Zhang, Shanghai, CN;
SHANGHAI HUALI INTEGRATED CIRCUIT CORPORATION, Shanghai, CN;
Abstract
A method of forming a strained semiconductor device includes: forming a substrate and a MOS device on the substrate; depositing a molecular plug film structure on the MOS device, The molecular plug film structure includes at least one molecular plug film, depositing a stress film on the molecular plug film structure, and performing an annealing process. The stress applied to the MOS device by the stress film is increased by the annealing process. The structure made by the method includes: a MOS device formed on a substrate, a molecular plug film structure formed on the MOS device, the molecular plug film structure includes at least one molecular plug film, and a stress film formed on the molecular plug film structure.