The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 17, 2022
Filed:
May. 28, 2020
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Anqing Cui, Sunnyvale, CA (US);
Dien-Yeh Wu, San Jose, CA (US);
Wei V. Tang, Santa Clara, CA (US);
Yixiong Yang, Fremont, CA (US);
Bo Wang, Chandler, AZ (US);
Assignee:
APPLIED MATERIALS, INC., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/768 (2006.01); H01L 21/48 (2006.01); H01L 21/02 (2006.01);
U.S. Cl.
CPC ...
H01L 21/76826 (2013.01); H01L 21/0228 (2013.01); H01L 21/4871 (2013.01);
Abstract
Process chamber lid assemblies and process chambers comprising same are described. The lid assembly has a housing with a gas dispersion channel in fluid communication with a lid plate. A contoured bottom surface of the lid plate defines a gap to a top surface of a gas distribution plate. A pumping channel is formed between an upper outer peripheral contour of the gas distribution plate and the lid plate.