The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 17, 2022

Filed:

Jun. 05, 2019
Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Sebastianus Adrianus Goorden, Eindhoven, NL;

Simon Reinald Huisman, Eindhoven, NL;

Duygu Akbulut, Eindhoven, NL;

Alessandro Polo, Arendonk, BE;

Johannes Antonius Gerardus Akkermans, Waalre, NL;

Arie Jeffrey Den Boef, Waalre, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
G03F 9/7046 (2013.01); G03F 9/7049 (2013.01); G03F 9/7065 (2013.01); G03F 9/7088 (2013.01); G03F 9/7092 (2013.01);
Abstract

The invention provides a position sensor () which comprises an optical system () configured to provide measurement radiation () to a substrate (). The optical system is arranged to receive at least a portion of radiation () diffracted by a mark () provided on the substrate. A processor () is applied to derive at least one position-sensitive signal () from the received radiation. The measurement radiation comprises at least a first and a second selected radiation wavelength. The selection of the at least first and second radiation wavelengths is based on a position error swing-curve model.


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