The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 10, 2022
Filed:
Mar. 14, 2018
Nissin Electric Co., Ltd., Kyoto, JP;
Shigeaki Kishida, Kyoto, JP;
Daisuke Matsuo, Kyoto, JP;
NISSIN ELECTRIC CO., LTD., Kyoto, JP;
Abstract
The purpose of the present invention is to improve uniformity of film deposition by a plasma-based sputtering device. Provided is a sputtering devicefor depositing a film on a substrate W through sputtering of targets T by using plasma P, said sputtering device being provided with a vacuum chamberwhich can be evacuated to a vacuum and into which a gas is to be introduced; a substrate holding partfor holding the substrate W inside the vacuum chamber; target holding partsfor holding the targets T inside the vacuum chamber; multiple antennaswhich are arranged along a surface of the substrate W held by the substrate holding partand generate plasma P; and a reciprocal scanning mechanismfor scanning back and forth the substrate holding partalong the arrangement direction X of the multiple antennas