The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 10, 2022

Filed:

Jan. 15, 2021
Applicant:

Carl Zeiss Smt Gmbh, Oberkochen, DE;

Inventors:

Steffen Siegler, Aalen, DE;

Thomas Schicketanz, Aalen, DE;

Assignee:

CARL ZEISS SMT GMBH, Oberkochen, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01B 11/24 (2006.01); G01B 9/02001 (2022.01); G01M 11/00 (2006.01); G03F 7/20 (2006.01); G01B 9/02 (2022.01);
U.S. Cl.
CPC ...
G01B 11/2441 (2013.01); G01B 9/02011 (2013.01); G01B 9/02039 (2013.01); G01M 11/005 (2013.01); G03F 7/70591 (2013.01); G01B 2290/70 (2013.01);
Abstract

A method and a device for characterizing the surface shape of an optical element. In the method, in at least one interferogram measurement carried out by an interferometric test arrangement, a test wave reflected at the optical element is caused to be superimposed with a reference wave not reflected at the optical element. In this case, the figure of the optical element is determined on the basis of at least two interferogram measurements using electromagnetic radiation having in each case linear input polarization or in each case circular input polarization, wherein the input polarizations for the two interferogram measurements differ from one another.


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