The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 10, 2022
Filed:
Jul. 27, 2020
Applicant:
Rockwell Collins, Inc., Cedar Rapids, IA (US);
Inventors:
Richard Korneisel, Cedar Rapids, IA (US);
Nathaniel P. Wyckoff, Marion, IA (US);
Jacob R. Mauermann, Marion, IA (US);
Bret W. Simon, West Liberty, IA (US);
Carlen R. Welty, Solon, IA (US);
Assignee:
Rockwell Collins, Inc., Cedar Rapids, IA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 14/04 (2006.01); B05C 21/00 (2006.01);
U.S. Cl.
CPC ...
C23C 14/042 (2013.01); B05C 21/005 (2013.01);
Abstract
A system and method includes pre-warping a mask to induce strain when affixed to a substrate and ensure positive contact between the mask and the substrate during all phases of deposition. A film is applied to the mask at a rate sufficient to impart stress to the film faster than such stress can be released. Depending on the features defined by the mask, the pre-warping may be concentric, linear along one axis, or complex along a plurality of axes.