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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11326049 B1

PDFFull Text
Date of Patent:
May. 10, 2022

Filed:

Aug. 09, 2017

Composition for surface treatment

Applicant:

Fujimi Incorporated, Kiyosu, JP;

Inventor:

Jingzhi Chen, Tonglou Township, TW;

Assignee:

FUJIMI INCORPORATED;

Attorney:

Katten Muchin Rosenman LLP

Primary Examiner:

Gregory R Delcotto

Int. Cl.
CPC ...
C11D 3/37 (2006.01); C11D 7/26 (2006.01); C11D 7/32 (2006.01); C08L 29/04 (2006.01); H01L 21/02 (2006.01); C08G 61/04 (2006.01); C08L 33/02 (2006.01); C08L 33/24 (2006.01); C11D 11/00 (2006.01); C11D 7/22 (2006.01); H01L 21/304 (2006.01); C11D 3/30 (2006.01); C11D 7/34 (2006.01);
U.S. Cl.
CPC ...
C08L 29/04 (2013.01); C08G 61/04 (2013.01); C08L 33/02 (2013.01); C08L 33/24 (2013.01); C11D 3/30 (2013.01); C11D 7/22 (2013.01); C11D 7/26 (2013.01); C11D 7/261 (2013.01); C11D 7/34 (2013.01); C11D 11/0047 (2013.01); H01L 21/02065 (2013.01); H01L 21/304 (2013.01); C08G 2261/1452 (2013.01); H01L 21/02002 (2013.01);
Abstract

To provide a composition for surface treatment capable of treating a surface of a polished object to be polished having both of a silicon-silicon bond and a nitrogen-silicon bond by sufficiently removing defects on the surface of the polished object to be polished. The composition for surface treatment contains a nonionic water-soluble polymer (A) having a main chain including only a carbon atom or a main chain consisting of a carbon atom and a nitrogen atom, and an anionic water-soluble polymer (B) having a main chain including only a carbon atom and a side chain having a sulfonic acid group or a group having a salt thereof or a carboxyl group or a group having a salt thereof, and being bonded to the main chain including only a carbon atom, and the composition is used for surface treatment of a polished object to be polished containing a silicon-silicon bond and a nitrogen-silicon bond and a pH of the composition is less than 9.0.

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Chen, Jingzhi. (2022). Composition for surface treatment (U.S. Patent No. 11326049). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11326049

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