The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 10, 2022

Filed:

Aug. 30, 2018
Applicants:

The University of Tokyo, Tokyo, JP;

Kawasaki Institute of Industrial Promotion, Kawasaki, JP;

Inventors:

Kazunori Kataoka, Kawasaki, JP;

Kanjiro Miyata, Tokyo, JP;

Shigeto Fukushima, Kawasaki, JP;

Kotaro Hayashi, Kawasaki, JP;

Sumiyo Watanabe, Tokyo, JP;

HyunJin Kim, Tokyo, JP;

Kazuko Toh, Kawasaki, JP;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
A61K 47/64 (2017.01); A61K 47/34 (2017.01); A61K 9/10 (2006.01); C12N 15/113 (2010.01); A61K 48/00 (2006.01);
U.S. Cl.
CPC ...
A61K 47/6455 (2017.08); A61K 9/10 (2013.01); A61K 47/34 (2013.01); C12N 15/1137 (2013.01); A61K 48/00 (2013.01); C12N 2310/14 (2013.01); C12N 2310/351 (2013.01);
Abstract

A unit-type polyion complex for use in delivering nucleic acid to a target site in a patient includes one or more molecules of a block copolymer having a poly(ethylene glycol) segment and a cationic poly(amino acid) segment and one or more molecules of a nucleic acid. A total quantity of positive charges derived from side chains of the cationic poly(amino acid) segment of the block copolymer in the unit-type polyion complex is not offset by a total quantity of negative charges derived from the nucleic acid. Furthermore, the nucleic acid has a strand length of 10-50 bases, the molecular weight of the poly(ethylene glycol) segment is 40×10or more, and the block copolymer has a binding constant (Ka) for the nucleic acid of 3.0×10or more.


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