The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 03, 2022

Filed:

Sep. 27, 2018
Applicant:

Intel Corporation, Santa Clara, CA (US);

Inventors:

Shafqat Ahmed, San Jose, CA (US);

Kiran Pangal, Fremont, CA (US);

Assignee:

Intel Corporation, Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/24 (2006.01); H01L 45/00 (2006.01); H01L 27/22 (2006.01); H01L 27/11507 (2017.01); H01L 43/12 (2006.01); H01L 43/02 (2006.01); G11C 13/00 (2006.01); H01L 49/02 (2006.01);
U.S. Cl.
CPC ...
H01L 27/2463 (2013.01); G11C 13/003 (2013.01); G11C 13/0026 (2013.01); G11C 13/0028 (2013.01); G11C 13/0033 (2013.01); H01L 27/11507 (2013.01); H01L 27/224 (2013.01); H01L 27/2409 (2013.01); H01L 27/2427 (2013.01); H01L 27/2481 (2013.01); H01L 43/02 (2013.01); H01L 43/12 (2013.01); H01L 45/1233 (2013.01); H01L 45/1246 (2013.01); H01L 45/1253 (2013.01); H01L 45/141 (2013.01); H01L 45/145 (2013.01); H01L 45/16 (2013.01); G11C 2213/51 (2013.01); G11C 2213/52 (2013.01); G11C 2213/71 (2013.01); H01L 28/60 (2013.01); H01L 45/04 (2013.01); H01L 45/06 (2013.01); H01L 45/08 (2013.01); H01L 45/085 (2013.01); H01L 45/10 (2013.01);
Abstract

A single memory cell array is formed to maintain current delivery and mitigate current spike through the deposition of resistive materials in two or more regions of the array, including at least one region of memory cells nearer to contacts on the conductive lines and at least one region of memory cells farther from the contacts, where the contacts connect the conductive lines to the current source. Higher and lower resistive materials are introduced during the formation of the memory cells and the conductive lines based on the boundaries and dimensions of the two or more regions using a photo mask. Multiple memory cell arrays formed to maintain current delivery and mitigate current spike can be arranged into a three-dimensional memory cell array. The regions of memory cells in each memory cell array can vary depending on resistance at the contacts on the conductive lines that provide access to the memory cells, where the resistance can vary from one memory cell array to another.


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