The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 03, 2022

Filed:

Feb. 26, 2020
Applicant:

Ebara Corporation, Tokyo, JP;

Inventor:

Shinichi Okada, Tokyo, JP;

Assignee:

EBARA CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/317 (2006.01); H01J 37/10 (2006.01); H01J 37/063 (2006.01); H01J 37/32 (2006.01); H01J 37/30 (2006.01);
U.S. Cl.
CPC ...
H01J 37/3177 (2013.01); H01J 37/063 (2013.01); H01J 37/10 (2013.01); H01J 37/3007 (2013.01); H01J 37/3255 (2013.01);
Abstract

A charged particle multi-beam device includes a charged particle source, a collimator lens, a multi-light-source forming unit, and a reduction projection optical system. The multi-light-source forming unit has first to third porous electrodes disposed side by side in an optical axis direction. A plurality of holes for causing the multi-beams to pass is formed in each of the first to third porous electrodes. The first porous electrode and the third porous electrode have the same potential and the second porous electrode has potential different from the potential of the first porous electrode and the third porous electrode. A diameter of the holes on the second porous electrode is formed larger further away from an optical axis such that a surface on which the multi-light sources are located is formed in a shape convex to the charged particle source side.


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