logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11320735 B1

PDFFull Text
Date of Patent:
May. 03, 2022

Filed:

Aug. 27, 2019

Radiation-sensitive resin composition, resist pattern-forming method, acid diffusion control agent, carboxylic acid salt and carboxylic acid

Applicant:

Jsr Corporation, Tokyo, JP;

Inventors:

Katsuaki Nishikori, Tokyo, JP;

Satoshi Okazaki, Tokyo, JP;

Assignee:

JSR CORPORATION, Tokyo, JP;

Attorney:

Oblon, McClelland, Maier & Neustadt, L.L.P.

Primary Examiner:

Amanda C Walke

Int. Cl.
CPC ...
G03F 7/004 (2006.01); C07C 59/105 (2006.01); C07C 59/11 (2006.01); C07C 59/115 (2006.01); C07C 59/13 (2006.01); C07C 69/14 (2006.01); C07C 381/12 (2006.01); C07D 307/00 (2006.01); C07D 307/33 (2006.01); G03F 7/038 (2006.01); G03F 7/039 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); G03F 7/38 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); C07C 59/105 (2013.01); C07C 59/11 (2013.01); C07C 59/115 (2013.01); C07C 59/13 (2013.01); C07C 69/14 (2013.01); C07C 381/12 (2013.01); C07D 307/00 (2013.01); C07D 307/33 (2013.01); G03F 7/038 (2013.01); G03F 7/039 (2013.01); C07C 2601/14 (2017.05); C07C 2603/18 (2017.05); C07C 2603/74 (2017.05); G03F 7/162 (2013.01); G03F 7/168 (2013.01); G03F 7/2006 (2013.01); G03F 7/2041 (2013.01); G03F 7/322 (2013.01); G03F 7/325 (2013.01); G03F 7/38 (2013.01);
Abstract

A radiation-sensitive resin composition contains: a polymer having an acid-labile group, a radiation-sensitive acid generator, a compound represented by the following formula (1), and a solvent. In the formula (1), X represents an oxygen atom or a sulfur atom; Rrepresents a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms; Rto Reach independently represent a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms, and optionally two or more of Rto Rtaken together represent an alicyclic structure having 3 to 20 ring atoms or an aliphatic heterocyclic structure having 3 to 20 ring atoms together with the carbon atom to which the two or more of Rto Rbond; Zrepresents a cation having a valency of n; and n is an integer of 1 to 3.

Find Patent Forward Citations

Loading…