The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 03, 2022
Filed:
Mar. 19, 2018
Applicant:
Fujimi Incorporated, Kiyosu, JP;
Inventors:
Assignee:
FUJIMI INCORPORATED, Kiyosu, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09G 1/04 (2006.01); C08K 5/14 (2006.01); H01L 21/304 (2006.01); H01L 29/16 (2006.01); C08K 3/26 (2006.01);
U.S. Cl.
CPC ...
C09G 1/04 (2013.01); C08K 3/26 (2013.01); C08K 5/14 (2013.01); H01L 21/304 (2013.01); H01L 29/1608 (2013.01); C08K 2003/262 (2013.01);
Abstract
Provided is a polishing composition that can effectively improve a polishing removal rate. According to the present invention, a polishing composition for polishing a polishing target material is provided. The polishing composition contains water, an oxidant, and a polishing removal accelerator, and does not contain abrasive. At least one metal salt selected from the group consisting of an alkali metal salt and an alkaline earth metal salt is contained as the polishing removal accelerator.