The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 26, 2022
Filed:
Sep. 09, 2020
Applicant:
Adaptive Plasma Technology Corp., Icheon-si, KR;
Inventors:
Woo Hyung Choi, Seongnam-si, KR;
Sang Woo Lee, Suwon-si, KR;
Assignee:
ADAPTIVE PLASMA TECHNOLOGY CORP., Icheon-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32568 (2013.01); H01J 37/3211 (2013.01); H01J 37/3299 (2013.01); H01J 2237/3344 (2013.01); H01L 21/67069 (2013.01);
Abstract
Provided is a structure variable type of a plasma source coil and a method for controlling the same. The plasma source coil comprises a plurality of coil branches extending in a spiral shape based on a central part, wherein at least one coil branch has a structure in which the extending direction or a tilting level can be adjusted.