The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 26, 2022
Filed:
Oct. 21, 2019
Applicant:
Applied Materials, Inc, Santa Clara, CA (US);
Inventors:
Dominic J. Benvegnu, La Honda, CA (US);
Nojan Motamedi, Sunnyvale, CA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06T 7/00 (2017.01); G06T 7/90 (2017.01); G06T 7/41 (2017.01);
U.S. Cl.
CPC ...
G06T 7/0004 (2013.01); G06T 7/41 (2017.01); G06T 7/90 (2017.01); G06T 2207/10024 (2013.01); G06T 2207/30148 (2013.01);
Abstract
A method of determining whether a substrate is properly polished includes obtaining an image of the substrate, obtaining intensity values of a luminance plane for the image, generating an intensity histogram from the intensity values of the luminance plane, and analyzing the intensity histogram to determine whether the intensity histogram meets one or more criteria.