The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 19, 2022
Filed:
Mar. 20, 2018
Itm Isotopen Technologien München Ag, Garching, DE;
Jussi Jernström, Neufahrn, DE;
Konstantin Zhernosekov, Munich, DE;
Mark Harfensteller, Unterschleissheim, DE;
Nevzat Kelmendi, Waldkraiburg, DE;
ITM Isotope Technologies Munich SE, Garching, DE;
Abstract
A method for the manufacture of highly purifiedGe material for radiopharmaceutical purposes. The invention particularly concerns the production ofGe-API (API=Active Pharmaceutical Ingredient) solution complying with the Guidelines for good manufacturing practices (GMP). Starting material for the method of the present invention can be aGe stock solution of commercial or other origin as raw material. SuchGe containing raw solutions are purified from potential metal and organic impurities originating from production processes. The radiochemical method disclosed is based on a twofold separation ofGe from organic and metallic impurities with two different adsorbent materials. During the first separation phaseGe is purified from both organic and metallic impurities by adsorption in germanium tetrachloride form, after which hydrolyzedGe is purified from remaining metallic impurities by cation exchange. The finalGe-API-product e.g. fulfills the regulatory requirements for specifications of the GMP production ofGe/Ga generators.