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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11300877 B1

PDFFull Text
Date of Patent:
Apr. 12, 2022

Filed:

Jul. 09, 2018

Radiation-sensitive resin composition, resist pattern-forming method and acid diffusion control agent

Applicant:

Jsr Corporation, Tokyo, JP;

Inventor:

Natsuko Kinoshita, Tokyo, JP;

Assignee:

JSR Corporation, Tokyo, JP;

Attorney:

Element IP, PLC

Primary Examiner:

John S Chu

Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/039 (2006.01); G03F 7/30 (2006.01); G03F 7/38 (2006.01); C07D 233/64 (2006.01); C07D 235/02 (2006.01); C07D 235/18 (2006.01); G03F 7/038 (2006.01); C08F 220/16 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); C08F 220/28 (2006.01); C08F 220/18 (2006.01); C08F 220/22 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); C07D 233/64 (2013.01); C07D 235/02 (2013.01); C07D 235/18 (2013.01); C08F 220/16 (2013.01); C08F 220/28 (2013.01); G03F 7/038 (2013.01); G03F 7/039 (2013.01); G03F 7/0397 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01); G03F 7/2006 (2013.01); G03F 7/2041 (2013.01); G03F 7/30 (2013.01); G03F 7/322 (2013.01); G03F 7/38 (2013.01); C08F 220/1806 (2020.02); C08F 220/1807 (2020.02); C08F 220/1808 (2020.02); C08F 220/1809 (2020.02); C08F 220/1811 (2020.02); C08F 220/1812 (2020.02); C08F 220/1818 (2020.02); C08F 220/22 (2013.01); C08F 220/281 (2020.02); C08F 220/283 (2020.02); C08F 2800/10 (2013.01);
Abstract

A radiation-sensitive resin composition includes: a first polymer having a first structural unit that includes an acid-labile group; a radiation-sensitive acid generator; and a first compound capable of forming a salt through a structural change in a molecule thereof upon irradiation with a radioactive ray. Basicity of the first compound preferably changes upon irradiation with a radioactive ray. The first compound preferably generates an acid upon irradiation with a radioactive ray. The first compound is preferably represented by formula (1). In formula (1), Arrepresents a substituted or unsubstituted heteroarenediyl group having 4 to 30 ring atoms and having at least one nitrogen atom as a ring-constituting atom.

Find Patent Forward Citations

Kinoshita, Natsuko. (2022). Radiation-sensitive resin composition, resist pattern-forming method and acid diffusion control agent (U.S. Patent No. 11300877). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11300877

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