The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 05, 2022
Filed:
Sep. 21, 2017
Applicant:
Asml Netherlands B.v., Veldhoven, NL;
Inventors:
Pierluigi Frisco, Eindhoven, NL;
Svetla Petrova Matova, Waalre, NL;
Jochem Sebastiaan Wildenberg, Aarle-Rixtel, NL;
Assignee:
ASML Netherlands B.V., Veldhoven, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/705 (2013.01); G03F 7/70616 (2013.01); G03F 7/70641 (2013.01); G03F 9/7026 (2013.01); G03F 9/7046 (2013.01); G03F 9/7076 (2013.01); G03F 9/7084 (2013.01);
Abstract
A method for selecting an optimal set of locations for a measurement or feature on a substrate, the method includes: defining a first candidate solution of locations, defining a second candidate solution with locations based on modification of a coordinate in a solution domain of the first candidate solution, and selecting the first and/or second candidate solution as the optimal solution according to a constraint associated with the substrate.