The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 05, 2022
Filed:
Apr. 30, 2020
HI Llc, Los Angeles, CA (US);
Jamu Alford, Simi Valley, CA (US);
Michael Henninger, Austin, TX (US);
Stephen Garber, Santa Monica, CA (US);
Jeffery Kang Gormley, Chatsworth, CA (US);
Dakota Blue Decker, Culver City, CA (US);
Scott Michael Homan, Culver City, CA (US);
Teague Lasser, Los Angeles, CA (US);
Micah Ledbetter, Sunnyvale, CA (US);
Jerry Leung, Marina Del Rey, CA (US);
Hooman Mohseni, Wilmette, IL (US);
Ethan Pratt, Santa Clara, CA (US);
Scott Jeremy Seidman, Glenview, IL (US);
Benjamin Siepser, Los Angeles, CA (US);
HI LLC, Los Angeles, CA (US);
Abstract
A magnetic field generator includes a first planar substrate, a second planar substrate positioned opposite to the first planar substrate and separated from the first planar substrate by a gap, a first wiring set on the first planar substrate, a second wiring set on the second planar substrate, and one or more interconnects between the first planar substrate and the second planar substrate. The one or more interconnects electrically connect the first wiring set with the second wiring set to form a continuous electrical path. The continuous electrical path forms a conductive winding configured to generate, when supplied with a drive current, a first component of a compensation magnetic field configured to actively shield a magnetic field sensing region located in the gap from ambient background magnetic fields along a first axis that is substantially parallel to the first planar substrate and the second planar substrate.