The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 29, 2022
Filed:
Aug. 31, 2020
Applicant:
Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;
Inventors:
Chin-Min Lin, Hsinchu, TW;
Cheng San Chou, Hsin Chu, TW;
Assignee:
TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD., Hsinchu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/146 (2006.01); H01L 31/16 (2006.01); G06K 9/00 (2022.01); H01L 31/167 (2006.01); H01L 27/32 (2006.01); H01L 27/15 (2006.01);
U.S. Cl.
CPC ...
H01L 27/14678 (2013.01); G06K 9/00 (2013.01); H01L 27/14621 (2013.01); H01L 27/14623 (2013.01); H01L 27/14625 (2013.01); H01L 27/14636 (2013.01); H01L 27/14685 (2013.01); H01L 27/3234 (2013.01); H01L 31/16 (2013.01); H01L 31/167 (2013.01); H01L 27/156 (2013.01); H01L 27/3213 (2013.01); H01L 27/3244 (2013.01); H01L 27/3281 (2013.01);
Abstract
A method of fabricating a sensing apparatus is disclosed. The method includes providing a substrate that includes a plurality of image sensors, forming an optical filtering film on the substrate, and forming a collimator on the optical filtering film. The method further includes forming a blocking layer on the collimator and forming an illumination layer on the blocking layer. The illumination layer is configured to illuminate an object placed above the illumination layer. The image sensors are configured to detect a portion of light reflected from the object.