The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 29, 2022
Filed:
Sep. 30, 2019
Applicant:
Taiwan Semiconductor Manufacturing Co., Ltd., Hsin-Chu, TW;
Inventor:
Chue San Yoo, Hsin-Chu, TW;
Assignee:
Taiwan Semiconductor Manufacturing Company, Ltd., Hsinchu, TW;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); H01L 21/311 (2006.01); H01L 23/544 (2006.01); H01L 21/67 (2006.01); H01L 21/68 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01L 21/31144 (2013.01); H01J 37/32009 (2013.01); H01L 21/31116 (2013.01); H01L 21/67063 (2013.01); H01L 21/67069 (2013.01); H01L 21/681 (2013.01); H01L 23/544 (2013.01); H01J 2237/334 (2013.01); H01L 2223/54426 (2013.01);
Abstract
A photo-free lithography process with low cost, high throughput, and high reliability is provided. A template mask is bonded to a production workpiece and comprises a plurality of openings defining a pattern. An etch is performed into the production workpiece, through the plurality of openings, to transfer the pattern of the template mask to the production workpiece. The template mask is de-bonded from the production workpiece. A system for performing the photo-free lithography process is also provided.