The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 29, 2022

Filed:

Mar. 30, 2019
Applicant:

Intel Corporation, Santa Clara, CA (US);

Inventors:

Sean Dardis, Hillsboro, OR (US);

Karunakara Kotary, Portland, OR (US);

Michael Kubacki, Hillsboro, OR (US);

Ankit Sinha, Hillsboro, OR (US);

Assignee:

Intel corporation, Santa Clara, CA (US);

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 11/14 (2006.01); G06F 8/65 (2018.01); G06F 8/71 (2018.01); G06F 9/4401 (2018.01);
U.S. Cl.
CPC ...
G06F 11/1433 (2013.01); G06F 8/65 (2013.01); G06F 8/71 (2013.01); G06F 9/4401 (2013.01);
Abstract

Methods, apparatus, systems and articles of manufacture for mitigating a firmware failure are disclosed. An example apparatus includes at least one hardware processor and first memory including instructions to be executed by the at least one hardware processor. The example apparatus further includes mask memory including a feature mask associated with a first firmware version, the feature mask identifying features of the first firmware version to be disabled. A platform firmware controller is to apply the first firmware version to the first memory for execution by the at least one processor, initialize the at least one processor using the feature mask, and in response to a detection of a failure, determine a first de-feature mask based on a second de-feature mask previously used by the at least one processor and the feature update mask; and initialize the processor using the first de-feature mask.


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