The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 29, 2022

Filed:

Feb. 19, 2019
Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Anton Bernhard Van Oosten, Lommel, BE;

Vidya Vaenkatesan, Eindhoven, NL;

James Norman Wiley, Menlo Park, CA (US);

Reinder Teun Plug, Eindhoven, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 1/84 (2012.01);
U.S. Cl.
CPC ...
G03F 7/7065 (2013.01); G03F 1/84 (2013.01); G03F 7/705 (2013.01); G03F 7/70641 (2013.01);
Abstract

A method for inspection of a patterning device. The method includes obtaining (i) patterning device apparatus data of a patterning device making process, (ii) a patterning device substrate map based on the patterning device apparatus data, and (iii) predicted process window limiting pattern locations corresponding to the patterning device based on the patterning device substrate map, and based on the process window limiting pattern locations, guiding a patterning device inspection apparatus to the process window limiting pattern locations for defect inspection.


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