The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 29, 2022

Filed:

Aug. 03, 2020
Applicant:

Asml Netherlands B.v., Veldhoven, NL;

Inventors:

Andrey Nikipelov, Eindhoven, NL;

Patrick Sebastian Uebel, Marloffstein, DE;

Amir Abdolvand, Eindhoven, NL;

Sebastian Thomas Bauerschmidt, Wendelstein, DE;

Peter Maximilian Götz, Altdorf, DE;

Natallia Eduardauna Uzunbajakava, Eindhoven, NL;

Assignee:

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G03F 7/70616 (2013.01); G03F 7/705 (2013.01);
Abstract

A system and method for providing a radiation source is disclosed. In one arrangement, the radiation source includes a gas cell having a window, an optical fiber that is hollow and has an axial direction, an end thereof being enclosed within the gas cell and optically coupled to the window via an optical path, and a surface, disposed around the end of the optical fiber, and extending past the end of the optical fiber in the axial direction towards the window so as to limit one or more selected from: the exchange of gas between the optical path and the remainder of the gas cell, ingress of plasma towards or into the optical fiber, and/or radical flux towards etch-susceptible surfaces.


Find Patent Forward Citations

Loading…