The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 22, 2022

Filed:

Dec. 03, 2018
Applicant:

Mycronic Ab, Täby, SE;

Inventors:

Per Askebjer, Akersberga, SE;

Mats Rosling, Täby, SE;

Assignee:

MICRONIC MYDATA AB, Taby, SE;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H05K 3/00 (2006.01); G03F 7/20 (2006.01); B41J 2/435 (2006.01);
U.S. Cl.
CPC ...
H05K 3/0017 (2013.01); B41J 2/435 (2013.01); G03F 7/2022 (2013.01); G03F 7/70333 (2013.01); G03F 7/70383 (2013.01); H05K 3/0082 (2013.01); H05K 2203/108 (2013.01); Y10T 29/49155 (2015.01);
Abstract

The technology disclosed relates to accommodating embedded substrates during direct writing onto a printed circuit board and to other patterning problems that benefit from an extended depth of focus. In particular, it relates to multi-focus direct writing of a workpiece by the continuous or step-wise movement of the workpiece during the sequence of exposures having different focus planes. In one implementation, a multi-arm rotating direct writer is configured for interleaved writing focused on two or more focal planes that generally correspond to two or more surface heights of a radiation sensitive layer that overlays the uneven workpiece. Alternating arms can produce interleaved writing to the two or more focal planes.


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