The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 2022
Filed:
Apr. 01, 2019
Tokyo Electron Limited, Tokyo, JP;
TOKYO ELECTRON LIMITED, Tokyo, JP;
Abstract
A substrate processing apparatusincludes processing unitseach configured to process a wafer W; tanksandeach configured to store a processing liquid; processing liquid supply unitsandeach configured to supply the processing liquid into the processing unit; drain unitsandeach configured to drain the processing liquid; supplement unitsandeach configured to supplement the tanksandwith the processing liquids; and a control unit. The control unitis configured to perform a process job by controlling the processing liquid supply unitsandand the processing unitand perform, when predetermined liquid exchange conditions are met during the performing of the process job, a liquid exchange processing in parallel with the process job by controlling the drain unitsandand the supplement unitsand