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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11281099 B1

PDFFull Text
Date of Patent:
Mar. 22, 2022

Filed:

May. 23, 2019

Resist composition, method of forming resist pattern, compound, acid generator, and method of producing compound

Applicant:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki, JP;

Inventors:

Hiroto Yamazaki, Kawasaki, JP;

Masatoshi Arai, Kawasaki, JP;

Yoshitaka Komuro, Kawasaki, JP;

Assignee:

Tokyo Ohka Kogyo Co., Ltd., Kawasaki, JP;

Attorney:

Knobbe Martens Olson & Bear LLP

Primary Examiner:

Amanda C Walke

Int. Cl.
CPC ...
G03F 7/004 (2006.01); C07C 381/12 (2006.01); G03F 7/039 (2006.01); C07C 309/12 (2006.01); C07C 303/22 (2006.01); C07D 339/08 (2006.01); C07D 333/54 (2006.01); C07D 327/04 (2006.01); G03F 7/038 (2006.01); G03F 7/32 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/38 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0045 (2013.01); C07C 303/22 (2013.01); C07C 309/12 (2013.01); C07C 381/12 (2013.01); C07D 327/04 (2013.01); C07D 333/54 (2013.01); C07D 339/08 (2013.01); G03F 7/0382 (2013.01); G03F 7/0392 (2013.01); C07C 2603/74 (2017.05); G03F 7/16 (2013.01); G03F 7/162 (2013.01); G03F 7/168 (2013.01); G03F 7/2004 (2013.01); G03F 7/2037 (2013.01); G03F 7/322 (2013.01); G03F 7/38 (2013.01);
Abstract

A resist composition including a compound represented by formula (b1) in which Rrepresents an aryl group which may have a substituent; Rand Reach independently represents an aryl group which may have a substituent or an alkyl group which may have a substituent; provided that at least one of the aryl group represented by Rand the aryl group or the alkyl group represented by Ror Rhas a substituent containing a halogen atom, and at least one of the aryl group represented by Rand the aryl group or the alkyl group represented by Ror Rhas a substituent containing a sulfonyl group; and Xrepresents a counteranion.

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Yamazaki, Hiroto. (2022). Resist composition, method of forming resist pattern, compound, acid generator, and method of producing compound (U.S. Patent No. 11281099). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11281099

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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