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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11281091 B1

PDFFull Text
Date of Patent:
Mar. 22, 2022

Filed:

Nov. 25, 2019

Photomask

Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Inventors:

You-Hua Chou, Hsinchu, TW;

Kuo-Sheng Chuang, Hsinchu, TW;

Assignee:

TAIWAN SEMICONDUCTOR MANUFACTURING CO., LTD., Hsinchu, TW;

Attorney:

Birch, Stewart, Kolasch & Birch, LLP

Primary Examiner:

Martin J Angebranndt

Int. Cl.
CPC ...
G03F 1/20 (2012.01); G03F 1/22 (2012.01); G03F 1/60 (2012.01); G03F 1/80 (2012.01); G03F 1/38 (2012.01); G03F 1/54 (2012.01); G03F 1/86 (2012.01);
U.S. Cl.
CPC ...
G03F 1/38 (2013.01); G03F 1/20 (2013.01); G03F 1/22 (2013.01); G03F 1/54 (2013.01); G03F 1/60 (2013.01); G03F 1/80 (2013.01); G03F 1/86 (2013.01);
Abstract

A photomask includes a patterned photomask plate and a supporting member. The patterned photomask plate has a pattern region and a peripheral region surrounding the pattern region. The patterned photomask plate includes a plurality of openings in the pattern region. The supporting member directly abuts the patterned photomask plate and is in a peripheral region of the patterned photomask plate. The supporting member is formed from a different material than the patterned photomask plate.

Find Patent Forward Citations

Chou, You-Hua. (2022). Photomask (U.S. Patent No. 11281091). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11281091

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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