The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 22, 2022
Filed:
Jan. 08, 2020
Tatsuji Nagaoka, Nagakute, JP;
Hiroyuki Nishinaka, Kyoto, JP;
Daisuke Tahara, Kyoto, JP;
Masahiro Yoshimoto, Kyoto, JP;
Tatsuji Nagaoka, Nagakute, JP;
Hiroyuki Nishinaka, Kyoto, JP;
Daisuke Tahara, Kyoto, JP;
Masahiro Yoshimoto, Kyoto, JP;
DENSO CORPORATION, Kariya, JP;
NATIONAL UNIVERSITY CORPORATION KYOTO INSTITUTE OF TECHNOLOGY, Kyoto, JP;
Abstract
A film formation apparatus is configured to epitaxially grow a film on a surface of a substrate, and the film formation apparatus may include: a stage configured to allow the substrate to be mounted thereon; a heater configured to heat the substrate; a mist supply source configured to supply mist of a solution that comprises a solvent and a material of the film dissolved in the solvent; a heated-gas supply source configured to supply heated gas that comprises gas constituted of a same material as a material of the solvent and has a higher temperature than the mist; and a delivery device configured to deliver the mist and the heated gas to the surface of the substrate.