The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 15, 2022
Filed:
Dec. 20, 2017
Applicant:
Atotech Deutschland Gmbh, Berlin, DE;
Inventors:
Kadir Tuna, Berlin, DE;
Arnd Kilian, Berlin, DE;
Assignee:
Atotech Deutschland GmbH, Berlin, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B22F 7/00 (2006.01); C25D 3/32 (2006.01); C23C 18/16 (2006.01); C23C 18/48 (2006.01); C23C 18/52 (2006.01); C09D 5/00 (2006.01); C09D 5/10 (2006.01); C23C 16/00 (2006.01); C23C 18/00 (2006.01);
U.S. Cl.
CPC ...
C25D 3/32 (2013.01); C23C 18/1658 (2013.01); C23C 18/48 (2013.01); C23C 18/52 (2013.01);
Abstract
The present invention concerns a tin plating bath comprising tin ions; at least one complexing agent selected from the group consisting of pyrophosphate ions, linear polyphosphate ions and cyclic polyphosphate ions and a nitrogen and sulfur containing stabilizing additive and titanium (III) ions as a reducing agent suitable to reduce tin ions to metallic tin. The present invention further discloses a method of depositing tin or a tin alloy onto a surface of a substrate. The tin plating bath is particularly suitable to be used in the electronics and semiconductor industry.