The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 08, 2022

Filed:

Sep. 20, 2017
Applicant:

Intel Corporation, Santa Clara, CA (US);

Inventors:

Ranjith Kumar, Beaverton, OR (US);

Quan Shi, Beaverton, OR (US);

Mark T. Bohr, Aloha, OR (US);

Andrew W. Yeoh, Portland, OR (US);

Sourav Chakravarty, Portland, OR (US);

Barbara A. Chappell, Portland, OR (US);

M. Clair Webb, North Logan, UT (US);

Assignee:

Intel Corporation, Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 27/118 (2006.01); G06F 30/392 (2020.01); H01L 27/02 (2006.01); H01L 27/092 (2006.01);
U.S. Cl.
CPC ...
H01L 27/11807 (2013.01); G06F 30/392 (2020.01); H01L 27/0207 (2013.01); H01L 27/0924 (2013.01); H01L 2027/11875 (2013.01);
Abstract

Multi version library cell handling and integrated circuit structures fabricated therefrom are described. In an example, an integrated circuit structure includes a plurality of gate lines parallel along a first direction of a substrate and having a pitch along a second direction orthogonal to the first direction. A first version of a cell type is over a first portion of the plurality of gate lines, the first version of the cell type including a first plurality of interconnect lines having a second pitch along the second direction, the second pitch less than the first pitch.


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