The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 08, 2022
Filed:
Jun. 26, 2020
Applied Materials, Inc., Santa Clara, CA (US);
Eswaranand Venkatasubramanian, Santa Clara, CA (US);
Edward L. Haywood, Santa Clara, CA (US);
Samuel E. Gottheim, Santa Clara, CA (US);
Pramit Manna, Santa Clara, CA (US);
Kien N. Chuc, Cupertino, CA (US);
Adam Fischbach, Campbell, CA (US);
Abhijit B. Mallick, Fremont, CA (US);
Timothy J. Franklin, Campbell, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
Embodiments of the present disclosure generally relate to a substrate processing chamber, and components thereof, for forming semiconductor devices. The processing chamber comprises a substrate support, and an edge ring is disposed around the substrate support. The edge ring comprises a material selected from the group consisting of quartz, silicon, cross-linked polystyrene and divinylbenzene, polyether ether ketone, AlO, and AlN. The material of the edge ring is selected to modulate the properties of hardmask films deposited on substrates in the processing chamber. As such, hardmask films having desired film properties can be deposited in the processing chamber without scaling up the RF power to the chamber.