The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 08, 2022

Filed:

Jan. 13, 2020
Applicants:

Tatsuji Nagaoka, Nagakute, JP;

Hiroyuki Nishinaka, Kyoto, JP;

Daisuke Tahara, Kyoto, JP;

Masahiro Yoshimoto, Kyoto, JP;

Inventors:

Tatsuji Nagaoka, Nagakute, JP;

Hiroyuki Nishinaka, Kyoto, JP;

Daisuke Tahara, Kyoto, JP;

Masahiro Yoshimoto, Kyoto, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); B05B 17/06 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02628 (2013.01); B05B 17/0653 (2013.01); H01L 21/02565 (2013.01);
Abstract

A film formation apparatus is configured to supply mist of a solution to a surface of a substrate so as to epitaxially grow a film on the surface of the substrate. The film formation apparatus may be provided with: a furnace configured to house and heat the substrate; a reservoir configured to store the solution; a heater configured to heat the solution in the reservoir; an ultrasonic transducer configured to apply ultrasound to the solution in the reservoir so as to generate the mist of the solution in the reservoir; and a mist supply path configured to carry the mist from the reservoir to the furnace.


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