The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 01, 2022

Filed:

Nov. 12, 2020
Applicant:

Micron Technology, Inc., Boise, ID (US);

Inventors:

Martin Brox, Munich, DE;

Satoru Sugimoto, Sagamihara, JP;

Elena Cabrera Bernal, Munich, DE;

Jan Pottgiesser, Kirchheim, DE;

Sven Piatkowski, Munich, DE;

Assignee:

Micron Technology, Inc., Boise, ID (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G05F 1/10 (2006.01); G05F 3/20 (2006.01); G11C 5/14 (2006.01);
U.S. Cl.
CPC ...
G05F 3/205 (2013.01); G11C 5/146 (2013.01);
Abstract

Methods, systems, and devices for back-bias optimization are described. An apparatus, such as an electronic apparatus, may include a first substrate region and a second substrate region. The apparatus may also include a voltage generator that is disposed on the first substrate region and that includes an output terminal coupled with a conductive path. The apparatus may also include a set of clamp circuits disposed on the second substrate region. The set of clamp circuits may be configured selectively couple the conductive path with a voltage supply.


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