The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 01, 2022
Filed:
May. 14, 2019
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
C08G 77/60 (2006.01); G03F 7/075 (2006.01); G03F 7/004 (2006.01); G03F 7/038 (2006.01); G03F 7/40 (2006.01); H01L 23/00 (2006.01); C08G 77/00 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01); G03F 7/32 (2006.01); G03F 7/38 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0757 (2013.01); C08G 77/60 (2013.01); G03F 7/0045 (2013.01); G03F 7/0382 (2013.01); G03F 7/40 (2013.01); H01L 24/11 (2013.01); H01L 24/13 (2013.01); C08G 77/70 (2013.01); C08G 77/80 (2013.01); G03F 7/168 (2013.01); G03F 7/2004 (2013.01); G03F 7/325 (2013.01); G03F 7/38 (2013.01); H01L 2224/11462 (2013.01); H01L 2224/11618 (2013.01); H01L 2224/13147 (2013.01);
Abstract
A photosensitive resin composition comprising (A) a silphenylene and polyether structure—containing polymer and (B) a photoacid generator is coated onto a substrate to form a photosensitive resin coating which has improved substrate adhesion, a pattern forming ability, crack resistance, and reliability as protective film.