The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 01, 2022
Filed:
Jul. 23, 2018
Applicant:
Shin-etsu Chemical Co., Ltd., Tokyo, JP;
Inventors:
Assignee:
SHIN-ETSU CHEMICAL CO., LTD., Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/039 (2006.01); C08L 41/00 (2006.01); C07C 381/12 (2006.01); C07C 309/12 (2006.01); G03F 7/004 (2006.01); C08F 228/02 (2006.01); G03F 7/11 (2006.01); G03F 7/20 (2006.01); C08F 20/38 (2006.01); C07D 327/06 (2006.01); C08F 12/14 (2006.01); C08F 12/22 (2006.01);
U.S. Cl.
CPC ...
G03F 7/039 (2013.01); C07C 309/12 (2013.01); C07C 381/12 (2013.01); C08F 228/02 (2013.01); C08L 41/00 (2013.01); G03F 7/0045 (2013.01); G03F 7/0046 (2013.01); G03F 7/0397 (2013.01); G03F 7/11 (2013.01); G03F 7/2041 (2013.01); C07D 327/06 (2013.01); C08F 12/14 (2013.01); C08F 12/22 (2013.01); C08F 20/38 (2013.01);
Abstract
A polymer comprising recurring units derived from a sulfonium salt of specific structure having a polymerizable group is coated to form a resist film which is amenable to precise micropatterning because of improved LWR, CDU and resolution.