The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 01, 2022

Filed:

Nov. 25, 2019
Applicant:

Entegris, Inc., Billerica, MA (US);

Inventors:

Tyler Moulton, Grafton, MA (US);

James Britto, Westport, MA (US);

Thomas Leblanc, Mendon, MA (US);

John C. Gaudreau, Chepachet, RI (US);

Assignee:

ENTEGRIS, INC., Billerica, MA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 47/00 (2006.01); B01D 47/06 (2006.01); B01D 47/10 (2006.01); B01D 47/14 (2006.01); B01D 53/18 (2006.01); B01D 53/75 (2006.01); B01D 53/78 (2006.01);
U.S. Cl.
CPC ...
B01D 47/06 (2013.01); B01D 47/10 (2013.01); B01D 47/14 (2013.01); B01D 53/18 (2013.01); B01D 53/75 (2013.01); B01D 53/78 (2013.01); B01D 2253/102 (2013.01); B01D 2257/302 (2013.01); F23J 2219/40 (2013.01);
Abstract

An active wet scrubbing filtration system for decontamination of a gas stream comprises components including one or more of: a) a vortexing apparatus which induces a contaminant-bearing gas into a helical flow; b) an initial scrubbing fluid spray section configured so as to project a spray of scrubbing fluid into the contaminant-bearing gas stream; c) an absorption structure; d) a condenser; and e) first and second scrubbing fluid decontamination systems that may be engaged or disengaged independently of each other. In some embodiments, the worksite comprises a clean room or one or more a semiconductor processing tools, which may include photolithography tools or photolithography tool clusters. In some embodiments, the active wet scrubbing filtration system may be useful in cleaning and recycling air or other process gasses for use in clean rooms or semiconductor processing tools.


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