The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 22, 2022

Filed:

Aug. 18, 2020
Applicant:

Nanya Technology Corporation, New Taipei, TW;

Inventors:

Chin-Ling Huang, Taoyuan, TW;

Yu-Fang Chen, New Taipei, TW;

Chun-Hsien Lin, New Taipei, TW;

Chia-Ping Liao, New Taipei, TW;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/04 (2006.01); H01L 21/44 (2006.01); H01L 23/525 (2006.01); H01L 27/112 (2006.01);
U.S. Cl.
CPC ...
H01L 23/5252 (2013.01); H01L 27/11206 (2013.01);
Abstract

An antifuse structure includes an active area, a gate electrode and a dielectric layer. The gate electrode is over the active area, in which the gate electrode is ring-shaped, and a portion of the gate electrode is overlapped with a portion of the active area in a vertical projection direction, and the portion of the active area has a dopant concentration higher than a dopant concentration of another portion of the active area. The dielectric layer is sandwiched between the portion of the active area and the portion of the gate electrode.


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