The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 22, 2022

Filed:

Sep. 18, 2020
Applicant:

Taiwan Semiconductor Manufacturing Co., Ltd., Hsinchu, TW;

Inventors:

Chun-Yao Ku, Hsinchu, TW;

Wen-Hao Chen, Hsinchu, TW;

Ming-Tao Yu, Hsinchu, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 30/30 (2020.01); H01L 23/528 (2006.01); H01L 27/02 (2006.01); G06F 30/392 (2020.01); G06F 30/398 (2020.01); G06F 30/394 (2020.01); G06F 111/20 (2020.01); G06F 115/06 (2020.01); G06F 119/06 (2020.01); G06F 119/12 (2020.01);
U.S. Cl.
CPC ...
G06F 30/392 (2020.01); G06F 30/394 (2020.01); G06F 30/398 (2020.01); H01L 23/528 (2013.01); H01L 27/0207 (2013.01); G06F 2111/20 (2020.01); G06F 2115/06 (2020.01); G06F 2119/06 (2020.01); G06F 2119/12 (2020.01);
Abstract

A method of generating a layout design of an integrated circuit. The method includes forming a first region having at least two first-type cell rows extending in a first direction. Each one of the first-type cell rows has a first row height measured along a second direction perpendicular to the first direction. The method also includes forming a second region having at least two second-type cell rows extending in the first direction. Each one of the second-type cell rows has a second row height measured along the second direction. The first region is adjacent to the second region, and the first row height of the first-type cell rows is different from the second row height of the second-type cell rows.


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